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Multi-Modal Instruction-Tuning Small-Scale Language-and-Vision Assistant for Semiconductor Electron Micrograph Analysis

arXiv 2409.07463 ↗First posted 27 Aug 2024cs.CV cs.LGcited by 0

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Abstract (arXiv)

We present a novel framework for analyzing and interpreting electron microscopy images in semiconductor manufacturing using vision-language instruction tuning. The framework employs a unique teacher-student approach, leveraging pre-trained multimodal large language models such as GPT-4 to generate instruction-following data for zero-shot visual question answering (VQA) and classification tasks, customizing smaller multimodal models (SMMs) for microscopy image analysis, resulting in an instruction-tuned language-and-vision assistant. Our framework merges knowledge engineering with machine learning to integrate domain-specific expertise from larger to smaller multimodal models within this specialized field, greatly reducing the need for extensive human labeling. Our study presents a secure, cost-effective, and customizable approach for analyzing microscopy images, addressing the challenges of adopting proprietary models in semiconductor manufacturing.

Key facts. No citing papers in the map yet (data through 7 Oct 2026). Builds on 48 of its 56 references that are in the map. First posted on arXiv 27 Aug 2024.

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References · 48

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  2. 2024Parameter-Efficient Quantized Mixture-of-Experts Meets Vision-Language Instruction Tuning for Semiconductor Electron Micrograph Analysis
  3. 2024Preliminary Investigations of a Multi-Faceted Robust and Synergistic Approach in Semiconductor Electron Micrograph Analysis: Integrating Vision Transformers with Large Language and Multimodal Models
  4. 2026A Mixture of Experts Foundation Model for Scanning Electron Microscopy Image Analysis
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  7. 2026Adapting Open-Weight MLLMs to Generate Point Prompts for Electron Microscopy Segmentation
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