mlsanityData to 14 Oct 2026

Parameter-Efficient Quantized Mixture-of-Experts Meets Vision-Language Instruction Tuning for Semiconductor Electron Micrograph Analysis

arXiv 2408.15305 ↗First posted 27 Aug 2024cs.LG cs.AI cs.CVcited by 1

On the map: Mixture-of-experts → Efficient MoE training and inference systems

Abstract (arXiv)

Semiconductors, crucial to modern electronics, are generally under-researched in foundational models. It highlights the need for research to enhance the semiconductor device technology portfolio and aid in high-end device fabrication. In this paper, we introduce sLAVA, a small-scale vision-language assistant tailored for semiconductor manufacturing, with a focus on electron microscopy image analysis. It addresses challenges of data scarcity and acquiring high-quality, expert-annotated data. We employ a teacher-student paradigm, using a foundational vision language model like GPT-4 as a teacher to create instruction-following multimodal data for customizing the student model, sLAVA, for electron microscopic image analysis tasks on consumer hardware with limited budgets. Our approach allows enterprises to further fine-tune the proposed framework with their proprietary data securely within their own infrastructure, protecting intellectual property. Rigorous experiments validate that our framework surpasses traditional methods, handles data shifts, and enables high-throughput screening.

Key facts. Cited by 1 paper in the map (data through 14 Oct 2026). Placed in Efficient MoE training and inference systems, one of 12 directions in Mixture-of-experts. Builds on 60 of its 72 references that are in the map. First posted on arXiv 27 Aug 2024.

Builds on

60 of 72 references.

References · 60

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38 more
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  1. 2024Foundational Model for Electron Micrograph Analysis: Instruction-Tuning Small-Scale Language-and-Vision Assistant for Enterprise Adoption
  2. 2024Multi-Modal Instruction-Tuning Small-Scale Language-and-Vision Assistant for Semiconductor Electron Micrograph Analysis
  3. 2024Preliminary Investigations of a Multi-Faceted Robust and Synergistic Approach in Semiconductor Electron Micrograph Analysis: Integrating Vision Transformers with Large Language and Multimodal Models
  4. 2026Bridging the Sim-to-Real Gap in Semiconductor Visual Program Synthesis via Input Binarization
  5. 2026A Mixture of Experts Foundation Model for Scanning Electron Microscopy Image Analysis
  6. 2025EM3M: An Electron Micrograph Dataset for Microstructural Segmentation and Generation
  7. 2026Bridging Foundation Models and ASTM Metallurgical Standards for Automated Grain Size Estimation from Microscopy Images
  8. 2024Sparks of Artificial General Intelligence(AGI) in Semiconductor Material Science: Early Explorations into the Next Frontier of Generative AI-Assisted Electron Micrograph Analysis