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Foundational Model for Electron Micrograph Analysis: Instruction-Tuning Small-Scale Language-and-Vision Assistant for Enterprise Adoption

arXiv 2408.13248 ↗First posted 23 Aug 2024cs.CV cs.AI cs.LGcited by 0

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Abstract (arXiv)

Semiconductor imaging and analysis are critical yet understudied in deep learning, limiting our ability for precise control and optimization in semiconductor manufacturing. We introduce a small-scale multimodal framework for analyzing semiconductor electron microscopy images (MAEMI) through vision-language instruction tuning. We generate a customized instruction-following dataset using large multimodal models on microscopic image analysis. We perform knowledge transfer from larger to smaller models through knowledge distillation, resulting in improved accuracy of smaller models on visual question answering (VQA) tasks. This approach eliminates the need for expensive, human expert-annotated datasets for microscopic image analysis tasks. Enterprises can further finetune MAEMI on their intellectual data, enhancing privacy and performance on low-cost consumer hardware. Our experiments show that MAEMI outperforms traditional methods, adapts to data distribution shifts, and supports high-throughput screening.

Key facts. No citing papers in the map yet (data through 7 Oct 2026). Builds on 56 of its 68 references that are in the map. First posted on arXiv 23 Aug 2024.

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  1. 2024Multi-Modal Instruction-Tuning Small-Scale Language-and-Vision Assistant for Semiconductor Electron Micrograph Analysis
  2. 2024Parameter-Efficient Quantized Mixture-of-Experts Meets Vision-Language Instruction Tuning for Semiconductor Electron Micrograph Analysis
  3. 2026A Mixture of Experts Foundation Model for Scanning Electron Microscopy Image Analysis
  4. 2024Preliminary Investigations of a Multi-Faceted Robust and Synergistic Approach in Semiconductor Electron Micrograph Analysis: Integrating Vision Transformers with Large Language and Multimodal Models
  5. 2026Bridging the Sim-to-Real Gap in Semiconductor Visual Program Synthesis via Input Binarization
  6. 2024Sparks of Artificial General Intelligence(AGI) in Semiconductor Material Science: Early Explorations into the Next Frontier of Generative AI-Assisted Electron Micrograph Analysis
  7. 2026Bridging Foundation Models and ASTM Metallurgical Standards for Automated Grain Size Estimation from Microscopy Images
  8. 2026Adapting Open-Weight MLLMs to Generate Point Prompts for Electron Microscopy Segmentation