mlsanityData to 7 Oct 2026

One-Shot Recognition of Manufacturing Defects in Steel Surfaces

arXiv 2005.05815 ↗First posted 12 May 2020cs.CV cs.AI cs.LGcited by 13

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Abstract (arXiv)

Quality control is an essential process in manufacturing to make the product defect-free as well as to meet customer needs. The automation of this process is important to maintain high quality along with the high manufacturing throughput. With recent developments in deep learning and computer vision technologies, it has become possible to detect various features from the images with near-human accuracy. However, many of these approaches are data intensive. Training and deployment of such a system on manufacturing floors may become expensive and time-consuming. The need for large amounts of training data is one of the limitations of the applicability of these approaches in real-world manufacturing systems. In this work, we propose the application of a Siamese convolutional neural network to do one-shot recognition for such a task. Our results demonstrate how one-shot learning can be used in quality control of steel by identification of defects on the steel surface. This method can significantly reduce the requirements of training data and can also be run in real-time.

Key facts. Cited by 13 papers in the map (data through 7 Oct 2026). First posted on arXiv 12 May 2020.

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Citing papers per year: 2021: 1; 2022: 2; 2023: 1; 2024: 7; 2025: 0; 2026: 2.

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  1. 2024Vision HgNN: An Electron-Micrograph is Worth Hypergraph of Hypernodescited by 3
  2. 2022Robust Anomaly Map Assisted Multiple Defect Detection with Supervised Classification Techniquescited by 1
  3. 2023RAFIC: Retrieval-Augmented Few-shot Image Classificationcited by 1
  4. 2024Parameter-Efficient Quantized Mixture-of-Experts Meets Vision-Language Instruction Tuning for Semiconductor Electron Micrograph Analysiscited by 1
  5. 2021Intelligent Vision Based Wear Forecasting on Surfaces of Machine Tool Elementscited by 0
  6. 2022A tomographic workflow to enable deep learning for X-ray based foreign object detectioncited by 0
  7. 2024Foundational Model for Electron Micrograph Analysis: Instruction-Tuning Small-Scale Language-and-Vision Assistant for Enterprise Adoptioncited by 0
  8. 2024Preliminary Investigations of a Multi-Faceted Robust and Synergistic Approach in Semiconductor Electron Micrograph Analysis: Integrating Vision Transformers with Large Language and Multimodal Modelscited by 0
  9. 2024Hierarchical Network Fusion for Multi-Modal Electron Micrograph Representation Learning with Foundational Large Language Modelscited by 0
  10. 2024EMCNet : Graph-Nets for Electron Micrographs Classificationcited by 0
  11. 2024Sparks of Artificial General Intelligence(AGI) in Semiconductor Material Science: Early Explorations into the Next Frontier of Generative AI-Assisted Electron Micrograph Analysiscited by 0
  12. 2026One-Shot Identification with Different Neural Network Approachescited by 0
1 more
  1. 2026Explainability for Fault Detection System in Chemical Processescited by 0