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MFRL-BI: Design of a Model-free Reinforcement Learning Process Control Scheme by Using Bayesian Inference

arXiv 2309.09205 ↗First posted 17 Sep 2023cs.LG cs.SY eess.SYcited by 0

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Abstract (arXiv)

Design of process control scheme is critical for quality assurance to reduce variations in manufacturing systems. Taking semiconductor manufacturing as an example, extensive literature focuses on control optimization based on certain process models (usually linear models), which are obtained by experiments before a manufacturing process starts. However, in real applications, pre-defined models may not be accurate, especially for a complex manufacturing system. To tackle model inaccuracy, we propose a model-free reinforcement learning (MFRL) approach to conduct experiments and optimize control simultaneously according to real-time data. Specifically, we design a novel MFRL control scheme by updating the distribution of disturbances using Bayesian inference to reduce their large variations during manufacturing processes. As a result, the proposed MFRL controller is demonstrated to perform well in a nonlinear chemical mechanical planarization (CMP) process when the process model is unknown. Theoretical properties are also guaranteed when disturbances are additive. The numerical studies also demonstrate the effectiveness and efficiency of our methodology.

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References · 6

  1. 2016Optimization Methods for Large-Scale Machine Learningcited by 1,140
  2. 2017Stochastic Gradient Descent as Approximate Bayesian Inferencecited by 298
  3. 2018A Tour of Reinforcement Learning: The View from Continuous Controlcited by 129
  4. 2021Instance-optimality in optimal value estimation: Adaptivity via variance-reduced Q-learningcited by 21
  5. 2021Reinforcement Learning for Process Control with Application in Semiconductor Manufacturingcited by 4
  6. 2021Second-order step-size tuning of SGD for non-convex optimizationcited by 3

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