# VPEvolve: A Self-Evolving Virtual Process Engineer for Computational Lithography

arXiv: https://arxiv.org/abs/2609.32473 · HTML: https://mlsanity.com/paper/2609.32473/

## Key facts

- No citing papers in the map yet (data through 14 Oct 2026).
- Builds on 19 of its 32 references that are in the map.
- First posted on arXiv 26 Sep 2026.

## Builds on (most cited first, 19 of 19)

- [ReAct: Synergizing Reasoning and Acting in Language Models](https://mlsanity.com/paper/2210.03629/) (2022)
- [Reflexion: Language Agents with Verbal Reinforcement Learning](https://mlsanity.com/paper/2303.11366/) (2023)
- [Toolformer: Language Models Can Teach Themselves to Use Tools](https://mlsanity.com/paper/2302.04761/) (2023)
- [Voyager: An Open-Ended Embodied Agent with Large Language Models](https://mlsanity.com/paper/2305.16291/) (2023)
- [ExpeL: LLM Agents Are Experiential Learners](https://mlsanity.com/paper/2308.10144/) (2023)
- [Agentic Context Engineering: Evolving Contexts for Self-Improving Language Models](https://mlsanity.com/paper/2510.04618/) (2025)
- [Agent Workflow Memory](https://mlsanity.com/paper/2409.07429/) (2024)
- [MLAgentBench: Evaluating Language Agents on Machine Learning Experimentation](https://mlsanity.com/paper/2310.03302/) (2023)
- [Darwin Godel Machine: Open-Ended Evolution of Self-Improving Agents](https://mlsanity.com/paper/2505.22954/) (2025)
- [ReasoningBank: Scaling Agent Self-Evolving with Reasoning Memory](https://mlsanity.com/paper/2509.25140/) (2025)
- [Gemma 4 Technical Report](https://mlsanity.com/paper/2607.02770/) (2026)
- [ChipNeMo: Domain-Adapted LLMs for Chip Design](https://mlsanity.com/paper/2311.00176/) (2023)
- [ChatEDA: A Large Language Model Powered Autonomous Agent for EDA](https://mlsanity.com/paper/2308.10204/) (2023)
- [DeepSeek-V4.1-Flash: Pushing the Limits of KV Cache Compression](https://mlsanity.com/paper/2609.19969/) (2026)
- [Large Language Model Agent for Hyper-Parameter Optimization](https://mlsanity.com/paper/2402.01881/) (2024)
- [DAMO: Deep Agile Mask Optimization for Full Chip Scale](https://mlsanity.com/paper/2008.00806/) (2020)
- [ILILT: Implicit Learning of Inverse Lithography Technologies](https://mlsanity.com/paper/2405.03574/) (2024)
- [SciNav: A General Agent Framework for Scientific Coding Tasks](https://mlsanity.com/paper/2603.20256/) (2026)
- [Intelligent OPC Engineer Assistant for Semiconductor Manufacturing](https://mlsanity.com/paper/2408.12775/) (2024)

## Abstract (arXiv)

Optical proximity correction (OPC) recipes grow as engineers add local rules to repair newly discovered lithography hotspots. Each correction can interact with existing rules, while lessons from commercial-tool trials remain scattered across code and logs. system combines a Virtual Process Engineer (VPE) harness with a Skill Bank of measured engineering experience. The harness equips a frozen language model with process manuals, layout analysis, recipe editing, and commercial-tool evaluation. The actor proposes changes to the global parameters, local targeted rules, or diagnostic trials. After each evaluation, an LLM reflector and curator turn the measured response into evidence-linked judgments. The actor retrieves them before its next trial. Feasible improvements update the retained recipe; every measured trial informs the Skill Bank that guides the next edit. The model weights remain fixed. On a FreePDK45-derived benchmark with ten commercial-tool evaluations per case, system reduces the mean per-case maximum edge placement error from 18.294 to 5.361 nm on Poly and from 22.052 to 15.692 nm on Metal1. Every final recipe satisfies the predefined quality constraints and improves the maximum error by at least 0.1 nm.