# Unitho: A Unified Multi-Task Framework for Computational Lithography

arXiv: https://arxiv.org/abs/2511.10255 · HTML: https://mlsanity.com/paper/2511.10255/

## Key facts

- Cited by 1 papers in the map (data through 14 Oct 2026).
- First posted on arXiv 13 Nov 2025.

## Built on by (most cited first, 1 of 1)

- [LithoGRPO: Fast Inverse Lithography via GRPO Reinforced Flow Matching](https://mlsanity.com/paper/2606.00228/) (2026)

## Abstract (arXiv)

Reliable, generalizable data foundations are critical for enabling large-scale models in computational lithography. However, essential tasks-mask generation, rule violation detection, and layout optimization-are often handled in isolation, hindered by scarce datasets and limited modeling approaches. To address these challenges, we introduce Unitho, a unified multi-task large vision model built upon the Transformer architecture. Trained on a large-scale industrial lithography simulation dataset with hundreds of thousands of cases, Unitho supports end-to-end mask generation, lithography simulation, and rule violation detection. By enabling agile and high-fidelity lithography simulation, Unitho further facilitates the construction of robust data foundations for intelligent EDA. Experimental results validate its effectiveness and generalizability, with performance substantially surpassing academic baselines.