# DECOR: Deep Embedding Clustering with Orientation Robustness

arXiv: https://arxiv.org/abs/2510.03328 · HTML: https://mlsanity.com/paper/2510.03328/

## Key facts

- No citing papers in the map yet (data through 14 Oct 2026).
- Builds on 8 of its 18 references that are in the map.
- First posted on arXiv 1 Oct 2025.

## Builds on (most cited first, 8 of 8)

- [A Simple Framework for Contrastive Learning of Visual Representations](https://mlsanity.com/paper/2002.05709/) (2020)
- [Momentum Contrast for Unsupervised Visual Representation Learning](https://mlsanity.com/paper/1911.05722/) (2019)
- [UMAP: Uniform Manifold Approximation and Projection for Dimension Reduction](https://mlsanity.com/paper/1802.03426/) (2018)
- [Improved Baselines with Momentum Contrastive Learning](https://mlsanity.com/paper/2003.04297/) (2020)
- [General E(2)-Equivariant Steerable CNNs](https://mlsanity.com/paper/1911.08251/) (2019)
- [DeepDPM: Deep Clustering With an Unknown Number of Clusters](https://mlsanity.com/paper/2203.14309/) (2022)
- [N2D: (Not Too) Deep Clustering via Clustering the Local Manifold of an Autoencoded Embedding](https://mlsanity.com/paper/1908.05968/) (2019)
- [Learning Hierarchical Graph Neural Networks for Image Clustering](https://mlsanity.com/paper/2107.01319/) (2021)

## Abstract (arXiv)

In semiconductor manufacturing, early detection of wafer defects is critical for product yield optimization. However, raw wafer data from wafer quality tests are often complex, unlabeled, imbalanced and can contain multiple defects on a single wafer, making it crucial to design clustering methods that remain reliable under such imperfect data conditions. We introduce DECOR, a deep clustering with orientation robustness framework that groups complex defect patterns from wafer maps into consistent clusters. We evaluate our method on the open source MixedWM38 dataset, demonstrating its ability to discover clusters without manual tuning. DECOR explicitly accounts for orientation variations in wafer maps, ensuring that spatially similar defects are consistently clustered regardless of its rotation or alignment. Experiments indicate that our method outperforms existing clustering baseline methods, thus providing a reliable and scalable solution in automated visual inspection systems.