# PatternPaint: Practical Layout Pattern Generation Using Diffusion-Based Inpainting

arXiv: https://arxiv.org/abs/2409.01348 · HTML: https://mlsanity.com/paper/2409.01348/

## Key facts

- Cited by 2 papers in the map (data through 14 Oct 2026).
- Builds on 7 of its 32 references that are in the map.
- First posted on arXiv 2 Sep 2024.

## Builds on (most cited first, 7 of 7)

- [Denoising Diffusion Probabilistic Models](https://mlsanity.com/paper/2006.11239/) (2020)
- [High-Resolution Image Synthesis with Latent Diffusion Models](https://mlsanity.com/paper/2112.10752/) (2021)
- [Diffusion Models Beat GANs on Image Synthesis](https://mlsanity.com/paper/2105.05233/) (2021)
- [DreamBooth: Fine Tuning Text-to-Image Diffusion Models for Subject-Driven Generation](https://mlsanity.com/paper/2208.12242/) (2022)
- [RePaint: Inpainting using Denoising Diffusion Probabilistic Models](https://mlsanity.com/paper/2201.09865/) (2022)
- [DiffPattern: Layout Pattern Generation via Discrete Diffusion](https://mlsanity.com/paper/2303.13060/) (2023)
- [ChatPattern: Layout Pattern Customization via Natural Language](https://mlsanity.com/paper/2403.15434/) (2024)

## Built on by (most cited first, 2 of 2)

- [SCALE: Self-Supervised Constraint-Aware Layout GEneration for Local P&R DRV Fixing at Advanced Nodes](https://mlsanity.com/paper/2607.21850/) (2026)
- [ISPCloak: Weaponizing ISP for Optimization-Free Physical Camouflage against Deepfake Detectors](https://mlsanity.com/paper/2607.21897/) (2026)

## Abstract (arXiv)

Generating diverse VLSI layout patterns is essential for various downstream tasks in design for manufacturing, as design rules continually evolve during the development of new technology nodes. However, existing training-based methods for layout pattern generation rely on large datasets. In practical scenarios, especially when developing a new technology node, obtaining such extensive layout data is challenging. Consequently, training models with large datasets becomes impractical, limiting the scalability and adaptability of prior approaches. To this end, we propose PatternPaint, a diffusion-based framework capable of generating legal patterns with limited design-rule-compliant training samples. PatternPaint simplifies complex layout pattern generation into a series of inpainting processes with a template-based denoising scheme. Furthermore, we perform few-shot finetuning on a pretrained image foundation model with only 20 design-rule-compliant samples. Experimental results show that using a sub-3nm technology node (Intel 18A), our model is the only one that can generate legal patterns in complex 2D metal interconnect design rule settings among all previous works and achieves a high diversity score. Additionally, our few-shot finetuning can boost the legality rate with 1.87X improvement compared to the original pretrained model. As a result, we demonstrate a production-ready approach for layout pattern generation in developing new technology nodes.