{"total":13,"rows":[{"id":"2309.15325","title":"Neural Operators for Accelerating Scientific Simulations and Design","created":"2023-09-27","cited_by_count":221,"area":null},{"id":"2207.04056","title":"Large Scale Mask Optimization Via Convolutional Fourier Neural Operator and Litho-Guided Self Training","created":"2022-07-08","cited_by_count":8,"area":null},{"id":"2502.08574","title":"TANTE: Time-Adaptive Operator Learning via Neural Taylor Expansion","created":"2025-02-12","cited_by_count":8,"area":null},{"id":"2405.03574","title":"ILILT: Implicit Learning of Inverse Lithography Technologies","created":"2024-05-06","cited_by_count":7,"area":null},{"id":"2303.08435","title":"Physics-Informed Optical Kernel Regression Using Complex-valued Neural Fields","created":"2023-03-15","cited_by_count":4,"area":null},{"id":"2308.12299","title":"Inverse Lithography Physics-informed Deep Neural Level Set for Mask Optimization","created":"2023-08-15","cited_by_count":3,"area":null},{"id":"2307.11075","title":"Reinforcement Learning for Photonic Component Design","created":"2023-07-14","cited_by_count":2,"area":null},{"id":"2210.15765","title":"An Adversarial Active Sampling-based Data Augmentation Framework for Manufacturable Chip Design","created":"2022-10-27","cited_by_count":1,"area":null},{"id":"2402.06034","title":"Optimizing Predictive AI in Physical Design Flows with Mini Pixel Batch Gradient Descent","created":"2024-02-08","cited_by_count":1,"area":null},{"id":"2602.19027","title":"Pushing the Limits of Inverse Lithography with Generative Reinforcement Learning","created":"2026-02-22","cited_by_count":1,"area":null},{"id":"2603.15584","title":"Physics-Informed Neural Systems for the Simulation of EUV Electromagnetic Wave Diffraction from a Lithography Mask","created":"2026-03-16","cited_by_count":1,"area":null},{"id":"2303.12529","title":"DevelSet: Deep Neural Level Set for Instant Mask Optimization","created":"2023-03-18","cited_by_count":0,"area":null},{"id":"2309.17343","title":"Neural Lithography: Close the Design-to-Manufacturing Gap in Computational Optics with a 'Real2Sim' Learned Photolithography Simulator","created":"2023-09-29","cited_by_count":0,"area":null}],"next_cursor":null}